The magnetron sputtering technology uses an electron source to generate electrons, which are accelerated and focused in a vacuum to form a high-speed energy particle beam to bombard the solid surface (target), and the excited atoms are deposited on the surface of the substrate to form a coating. This technology has many advantages such as high film density, good adhesion, green environmental protection, etc., and has become a hot spot of research and development and attention in the field of new materials at home and abroad. Gold-based alloy is a new type of functional material developed to adapt to the development of modern microelectronics technology and jewelry industry. It not only maintains the original excellent properties of pure gold such as oxidation resistance and corrosion resistance, but also greatly improves its recrystallization temperature. Gold-based alloys are plated on the surface of various base parts by vacuum magnetron Tantalum Sputtering Target technology. The gold-plated parts are widely used in the electronic industry and cutting-edge technology fields due to their high temperature resistance and acid medium corrosion resistance. Such gold-plated materials are often used in various instrument parts on aerospace vehicles, astronaut equipment, jet engines, heat reflectors, infrared devices, etc. As the source material in the magnetron sputtering process, the quality of gold-based alloy targets plays a crucial role in the performance of sputtered gold-plated films. Therefore, how to improve the target preparation technology to improve the target quality and research and development to meet market demand The new high value-added magnetron sputtering gold-based alloy target is of great significance.
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