With the development of the times, in order to meet the requirements of safer, more energy-efficient, lower noise, and reduce pollutant emissions, vacuum plating has become a new environmental protection trend in the surface treatment process. Unlike ordinary plating, vacuum plating is more environmentally friendly. At the same time, vacuum plating can produce a black effect with a good gloss that cannot be achieved by ordinary plating.
Vacuum plating is basically a physical deposition phenomenon, that is, argon is injected in a vacuum state, and the argon gas hits the target. The separated components of the target are adsorbed by the conductive goods to form a uniform and smooth surface layer. In this electroplating process, the target material is very important. So what are the applications of the target material in the vacuum electroplating process? Today, will introduce you in detail.
Generally, the application of targets in vacuum plating has the following characteristics:
(1) Metal, alloy or insulator can be made into thin-film material.
(2) Multiple and complex targets can be made into thin films of the same composition under appropriate setting conditions.
(3) By adding oxygen or other active gas in the discharge atmosphere, a mixture or compound of a target substance and a gas molecule can be produced.
(4) The target input current and sputtering time can be controlled, and it is easy to obtain high-precision film thickness.
(5) Compared with other processes, it is beneficial to produce a large area of the uniform film.
(6) The sputtering particles are not affected by gravity, and the positions of the target and the substrate can be freely arranged.
(7) The adhesion strength between the substrate and the film is more than 10 times that of the ordinary vapor-deposited film, and because the sputtered particles have high energy, the surface will continue to diffuse on the film-forming surface to obtain a hard and dense film. At the same time, this high energy makes the substrate as long as Crystals can be obtained at lower temperatures.
(8) The initial nucleation density of the thin film is high, and it can produce very thin continuous films below 10nm.
(9) The target has a long life and can be continuously and automatically produced for a long time.
(10) The target can be made into various shapes, with the special design of the machine for better control and efficiency
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